磁控溅射制备Ni/Ti多层膜表面粗糙度

采用磁控溅射方法制备了周期数分别为10,30,50和75的Ni/Ti多层膜,利用X射线掠入射反射测量了多层膜表面和界面的状态,并用原子力显微镜测量了多层膜的表面粗糙度,研究了不同周期数的Ni/Ti多层膜表面粗糙度的变化规律。结果表明:Ni/Ti多层膜表面粗糙度随着膜层数增加而增加,当Ni/Ti多层膜的周期数从10变化到75时,其表面粗糙度由0.80 nm增大到1.69 nm。实验数据拟合表明:Ni/Ti多层膜表面粗糙度与周期数成3次方关系;但在周期数较小时,粗糙度与周期数成线性关系。

Surface roughness of Ni/Ti multilayers made by magnetron sputtering

Nickel/titanium multilayers with different period of 10, 30, 50 and 75 were fabricated by DC magnetron sputtering. Grazing incidence X-ray measured reflectivity was used to characterize the interfacial roughness of the multilayers. To study the evolution law of surface roughness of Ni/Ti multilayers with different period numbers, atomic force microscope(AFM) was used to characterize the surfaces of the multilayers. The results show that surface roughness of Ni/Ti multilayers increases with the number of periods of the multilayers. As the number of periods increases from 10 to 75, the roughness increases from 0.8 nm to 1.69 nm. Fitting results show that surface roughness mainly varies with the number of periods as a cubic function.