| SiO2内保护层对LiB3O5晶体倍频增透膜损伤阈值的影响 |
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| 引用本文： | 于爱芳,范飞镝,刘中星,朱镛,陈创天.SiO2内保护层对LiB3O5晶体倍频增透膜损伤阈值的影响[J].强激光与粒子束,2007,19(4):603-606. |
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| 作者姓名： | 于爱芳 范飞镝 刘中星 朱镛 陈创天 |
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| 作者单位： | 1. 中国科学院 理化技术研究所 人工晶体研究与发展中心, 北京 100080； 2. 中国科学院 研究生院, 北京 100039 |
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| 基金项目： | 国家高技术研究发展计划(863计划) |
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| 摘 要： | 利用离子辅助电子束沉积方法在LiB3O5基底上镀制了不加SiO2内保护层和加SiO2内保护层的倍频增透膜，测量了两类薄膜在波长1 064 nm多脉冲辐照下的激光损伤阈值，获得了两种不同的损伤形貌，并对损伤原因作了初步探讨。实验结果表明：保护层的加入把由基底膜层界面缺陷吸收所决定的阈值改变到由HfO2膜层内缺陷吸收所决定的阈值，显著提高了倍频增透膜的抗激光损伤能力。
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| 关 键 词： | LiB3O5 SiO2内保护层 倍频增透膜 激光损伤阈值 损伤形貌 |
| 文章编号： | 1001-4322(2007)04-0603-04 |
| 收稿时间： | 2006/12/12 |
| 修稿时间： | 2006-12-12 |
Effect of SiO2 barrier layer on laser induced damage threshold of second harmonic antireflection coatings on LiB3O5 crystal |
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| YU Ai-fang,FAN Fei-di,LIU Zhong-xing,ZHU Yong,CHEN Chuang-tian.Effect of SiO2 barrier layer on laser induced damage threshold of second harmonic antireflection coatings on LiB3O5 crystal[J].High Power Laser and Particle Beams,2007,19(4):603-606. |
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| Authors: | YU Ai-fang FAN Fei-di LIU Zhong-xing ZHU Yong CHEN Chuang-tian |
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| Institution: | 1. Beijing Center for Crystal Research and Development, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing 100080, China;2. Graduate School of Chinese Academy of Sciences, Beijing 100039, China |
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| Abstract: | Two different kinds of second harmonic antireflection(AR) coatings,with and without SiO2 barrier layer were prepared with ion assisted deposition on LiB3O5 crystal.Laser induced damage threshold(LIDT) by multiple-shot irradiation at 1 064 nm was studied and two typical damage morphologies were observed by SEM.The AR coatings with SiO2 barrier layer have an excellent LIDT,which is about 40% higher than that of coatings without barrier layer.The mechanism of LIDT enhancement by adding SiO2 barrier layer is also discussed. |
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| Keywords: | LiB3O5 |
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