| 用表面热透镜技术测量1315nm高反射硅镜弱吸收的研究 |
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| 引用本文： | 王英剑,胡海洋,李庆国,范正修.用表面热透镜技术测量1315nm高反射硅镜弱吸收的研究[J].强激光与粒子束,2000,12(7). |
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| 作者姓名： | 王英剑 胡海洋 李庆国 范正修 |
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| 作者单位： | 中国科学院上海光学精密机械研究所，上海市800-211信箱 201800 |
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| 摘 要： | 运用表面热透镜技术精确测量了1315nm高反射硅镜的弱吸收，判断引起吸收的原因，从而为工艺上减少吸收降低损耗提供了保证。
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| 关 键 词： | 表面热透镜技术 弱吸收 |
| 收稿时间： | 1900-01-01; |
The study of weak absorption of the high reflection thin films coated on the Si plates at 1315nm by the STL |
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| wang ying-jian,hu hai-yang,li qing-guo,fan zheng-xiu.The study of weak absorption of the high reflection thin films coated on the Si plates at 1315nm by the STL[J].High Power Laser and Particle Beams,2000,12(7). |
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| Authors: | wang ying-jian hu hai-yang li qing-guo fan zheng-xiu |
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| Institution: | Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences,P.O.Box 800-211, Shanghai 201800, China |
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| Abstract: | Using surface thermal lensing method to measure weak absorption of the thin films coated on the Si plates at 1315nm, we have concluded the reason that induced absorption, and can give a measuring guarantee to reduce their absorption and loss in the process of coating thin films． |
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| Keywords: | weak absorption |
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