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钛膜的电解抛光技术研究
引用本文:张素银,杜凯,邢丕峰,李朝阳,郑凤成,谢军.钛膜的电解抛光技术研究[J].强激光与粒子束,2007,19(9):1479-1482.
作者姓名:张素银  杜凯  邢丕峰  李朝阳  郑凤成  谢军
作者单位:1.中国工程物理研究院 激光聚变研究中心, 四川 绵阳 621900; 2.黄河科技学院 数理部, 郑州 450063
基金项目:国家高技术研究发展计划(863计划)
摘    要: 分析了硫酸、硝酸、氢氟酸;硫酸、乙酸、氢氟酸;乙醇、正丁醇、氯化锌、氯化铝;高氯酸、乙酸;硫酸、甲醇这5种不同电解液组成对钛薄膜表面粗糙度、表面形貌的影响,得出硫酸、甲醇混合溶液是一种较理想的电解液体系。设置合适的抛光电压、温度、时间、泵速等工艺参数,制备出了表面平整光滑,平均粗糙度小于30 nm的钛膜。分析了硫酸、甲醇电解液阳极电压与试样表面减薄速率的关系:试样的减薄速率开始随电压的升高而增大;当电压达到28~34 V时,减薄速率随电压变化很慢,当电压继续增大时,减薄速率又会迅速增大,金属膜继续溶解。

关 键 词:电解液  电解抛光  钛膜  表面粗糙度  表面形貌
文章编号:1001-4322(2007)09-1479-04
收稿时间:2006/11/10
修稿时间:2006-11-10

Investigation on electropolishing of Ti film
ZHANG Su-yin,DU Kai,XING Pi-feng,LI Zhao-yang,ZHENG Feng-cheng,XIE Jun.Investigation on electropolishing of Ti film[J].High Power Laser and Particle Beams,2007,19(9):1479-1482.
Authors:ZHANG Su-yin  DU Kai  XING Pi-feng  LI Zhao-yang  ZHENG Feng-cheng  XIE Jun
Institution:1. Research Center of Laser Fusion, CAEP, P.O.Box 919-987, Mianyang 621900, China;2.Department of Physics and Mathematics, Huanghe Science and Technology College, Zhengzhou 450063, China
Abstract:The influence of electrolyte component on the surface roughness and topography of Ti film has been analyzed. It is found that, the solution of sulfuric acid and methanol is an ideal electrolyte system compared with the other electrolyte systems mentioned in this paper. The Ti films with surface mean roughness value less than 30 nm were obtained under appropriate electropolishing process conditions such as polishing potential, temperature, time, flow rate etc.The relation between anodic potential and removal rate of the metal was investigated in the solution of sulfuric acid and methanol.The removal rate increases with the polishing potential increasing at the initiative stage of polishing. When the potential reaches 28~42 V,the rate keeps almost constant. The rate increases swift again w
Keywords:Electrolyte  Electropolishing  Ti film  Surface roughness  Surface topography
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