| 在19.5 nm处高反在30.4 nm处抑制的双功能薄膜 |
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| 引用本文： | 蒋励,王晓强,谭默言,黄秋实,李浩川,周斯卡,朱京涛,王占山.在19.5 nm处高反在30.4 nm处抑制的双功能薄膜[J].强激光与粒子束,2011,23(5). |
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| 作者姓名： | 蒋励 王晓强 谭默言 黄秋实 李浩川 周斯卡 朱京涛 王占山 |
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| 作者单位： | 1. 同济大学 物理系, 精密光学工程技术研究所 上海 200092； 2. 上海市特殊人工微结构材料与技术重点实验室， 上海 200092 |
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| 基金项目： | 国家自然科学基金项目(10825521); 上海市科委资助项目(09XD1404000); 科技部国际合作项目(2008DFA01920) |
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| 摘 要： | 研究了极紫外波段的双功能光学元件。采用周期膜叠加的思想，运用遗传方法优化设计了在19.5 nm处高反，在30.4 nm处抑制的双功能多层膜。采用磁控溅射技术制备了多层膜，利用X射线衍射仪测试了多层膜的结构，在国家同步辐射实验室测试了双功能多层膜的反射特性。结果表明：制备出的双功能膜性能与设计相符，在入射角13°，19.5 nm处的反射率达到33.3%，接近传统的19.5 nm周期高反膜的反射率，并且在30.4 nm附近将反射率由1.1%降到9.6×10-4。
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| 关 键 词： | 双功能 多层膜 极紫外 直流磁控溅射 同步辐射 |
| 收稿时间： | 1900-01-01; |
Dual-functional multilayer for high-reflectivity at 19.5 nm and low-reflectivity at 30.4 nm |
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| Jiang Li,Wang Xiaoqiang,Tan Moyan,Huang Qiushi,Li Haochuan,Zhou Sika,Zhu Jingtao,Wang Zhanshan.Dual-functional multilayer for high-reflectivity at 19.5 nm and low-reflectivity at 30.4 nm[J].High Power Laser and Particle Beams,2011,23(5). |
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| Authors: | Jiang Li Wang Xiaoqiang Tan Moyan Huang Qiushi Li Haochuan Zhou Sika Zhu Jingtao Wang Zhanshan |
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| Institution: | (1. Institute of Precision Optics Engineering, Department of Physics, Tongji University, Shanghai 200092, China; 2. Shanghai Key Laboratory of Special Artifical Microstructure Materials and Technology, Shanghai 200092, China) |
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| Abstract: | A dual-functional extreme ultraviolet(EUV) multilayer (ML) mirror was designed for high-reflectivity at 19.5 nm ( Fe Ⅻ line ) and low-reflectivity at 30.4 nm ( He Ⅱ line ). The design based on genetic algorithm (GA) utilized a stack composed of two periodic multilayers: a bottom multilayer for high reflectivity at 19.5 nm, and a top multilayer for low-reflectivity at 30.4 nm. The multilayer mirror was prepared by direct current magnetron sputtering, and characterized by grazing-incident X-ray diffraction(XRD) and synchrotron radiation(SR). The experiment results show that the dual-functional multilayer achieves the reflectivity of 33.3% at 19.5 nm and 9.6×10-4 at 30.4 nm at incident angle of 13°. |
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| Keywords: | dual-functional multilayer extreme ultraviolet direct current magnetron sputtering synchrotron radiation |
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