Spatial variation behaviors of argon inductively coupled plasma during discharge mode transition |
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Authors: | Gao Fei Li Xue-Chun Zhao Shu-Xia Wang You-Nian |
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Institution: | a School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024, China;b Research Group PLASMANT, Department of Chemistry, University of Antwerp, Universiteitsplein 1, B-2610 Antwerp, Belgium |
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Abstract: | A Langmuir probe and an ICCD are employed to study the discharge mode transition in an Ar inductively coupled plasma. Electron density and plasma emission intensity are measured during the E (capacitive discharge) to H (inductive discharge) mode transitions at different pressures. It is found that plasma exists with a low electron density and a weak emission intensity in the E mode, while it has a high electron density and a strong emission intensity in the H mode. Meanwhile, the plasma emission intensity spatial (2D image) profile is symmetrical in the H mode, but the 2D image is an asymmetric profile in the E mode. Moreover, the electron density and emission intensity jump up discontinuously at high pressure, but increase almost continuously at the E to H mode transition under low pressure. |
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Keywords: | mode transition inductively coupled plasma Langmuir probe ICCD |
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