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Influence of a two-dimensional electron gas on current—voltage characteristics of Al0.3{Ga}0.7 N/GaN high electron mobility transistors
引用本文:冀东,刘冰,吕燕伍,邹杪,范博龄.Influence of a two-dimensional electron gas on current—voltage characteristics of Al0.3{Ga}0.7 N/GaN high electron mobility transistors[J].中国物理 B,2012,21(6):67201-067201.
作者姓名:冀东  刘冰  吕燕伍  邹杪  范博龄
作者单位:School of Science,Beijing Jiaotong University;School of Electronic and Information Engineering,Beijing Jiaotong University
基金项目:Project supported by the National Natural Science Foundation of China (Grant No. 60976070) and the Excellent Science and Technology Innovation Program from Beijing Jiaotong University, China.
摘    要:The J-V characteristics of AltGa1 tN/GaN high electron mobility transistors(HEMTs) are investigated and simulated using the self-consistent solution of the Schro dinger and Poisson equations for a two-dimensional electron gas(2DEG) in a triangular potential well with the Al mole fraction t = 0.3 as an example.Using a simple analytical model,the electronic drift velocity in a 2DEG channel is obtained.It is found that the current density through the 2DEG channel is on the order of 10^13 A/m^2 within a very narrow region(about 5 nm).For a current density of 7 × 10^13 A/m62 passing through the 2DEG channel with a 2DEG density of above 1.2 × 10^17 m^-2 under a drain voltage Vds = 1.5 V at room temperature,the barrier thickness Lb should be more than 10 nm and the gate bias must be higher than 2 V.

关 键 词:高电子迁移率晶体管  二维电子气  电流密度  电压特性  GaN  2DEG  泊松方程  HEMT
收稿时间:2011-08-03

Influence of a two-dimensional electron gas on current-voltage characteristics of Al0.3Ga0.7 N/GaN high electron mobility transistors
Ji Dong,Liu Bing,L&#,Yan-Wu,Zou Miao,Fan Bo-Ling.Influence of a two-dimensional electron gas on current-voltage characteristics of Al0.3Ga0.7 N/GaN high electron mobility transistors[J].Chinese Physics B,2012,21(6):67201-067201.
Authors:Ji Dong  Liu Bing  L&#  Yan-Wu  Zou Miao  Fan Bo-Ling
Institution:a. School of Science, Beijing Jiaotong University, Beijing 100044, China;b. School of Electronic and Information Engineering, Beijing Jiaotong University, Beijing 100044, China
Abstract:two-dimensional electron gas, high electron mobility transistor, heterointerface, nitridesemiconductor
Keywords:two-dimensional electron gas  high electron mobility transistor  heterointerface  nitride semiconductor
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