Analytical solution of crystal diffraction intensity |
| |
| Institution: | 1.Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang 621900, China;2.College of Optoelectronic Engineering, Chongqing University of Posts and Telecommunications, Chongqing 400065, China;3.Key Laboratory of Optoelectronic Technology and Systems of the Education Ministry of China, Chongqing University, Chongqing 400030, China;4.Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang 621900, China |
| |
| Abstract: | Plasma density and temperature can be diagnosed by x-ray line emission measurement with crystal, and bent crystals such as von Hamos and Hall structures are proposed to improve the diffraction brightness. In this study, a straightforward solution for the focusing schemes of flat and bent crystals is provided. Simulations with XOP code are performed to validate the analytical model, and good agreements are achieved. The von Hamos or multi-cone crystal can lead to several hundred times intensity enhancements for a 200μm plasma source. This model benefits the applications of the focusing bent crystals. |
| |
| Keywords: | crystal diffraction analytic method x-ray diffraction |
|
| 点击此处可从《中国物理 B》浏览原始摘要信息 |
| 点击此处可从《中国物理 B》下载免费的PDF全文 |
|
