Analysis of waveguide structure for surface plasmon polariton interference |
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Authors: | Wang Jing-Quan Liang Hui-Min Fang Liang Li Min Niu Xiao-Yun and Du Jing-Lei |
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Institution: | Physics Department, Sichuan University, Chengdu 610064, China; College of Science, Hebei University of Engineering, Hebei 056038, China; Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China |
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Abstract: | This paper describes a multi-reflected mode based on a
narrow waveguide to enlarge the interferential area of surface
plasmon polaritons (SPPs). A reasonable thickness of metal film is
coated under the waveguide, the incident angle and the waveguide
thickness are optimized in order to effectively increase
interferential area. This is a key point for research into the
Goos--H\"anchen shift to optimize the waveguide thickness. Finally,
the SPP interferential field is simulated with the finite-difference
time-domain (FDTD) technique to prove the optimized results, and
indicates that not only is the interferential area enlarged, but
the high contrast is also maintained. Furthermore, the mode can
fabricate some specific interferential patterns by adding some
modulating techniques to the waveguide. So the mode has potential
application in the fabrication of sub-wavelength patterns. |
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Keywords: | surface plasmon polaritons (SPPs) sub-wavelength
interferential lithography waveguide Goos--H\"anchen
shift |
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