Particle-in-Cell/Monte Carlo Collision simulation of planar DC magnetron sputtering |
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Authors: | Zhao Hua-Yu and Mu Zong-Xin |
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Institution: | State Key Laboratory of Materials Modification by Laser, Ion and Electron Beams, School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024, China |
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Abstract: | In this paper a numerical simulation of a planar DC magnetron
discharge is performed with the Particle-in-Cell/Monte Carlo
Collision (PIC/MCC) method. The magnetic field used in the
simulation is calculated with finite element method according to
experimental configuration. The simulation is carried out under the
condition of gas pressure of 0.665\,Pa and voltage magnitude of
400V. Typical results such as the potential distribution, charged
particle densities, the discharge current density and ion flux onto
the target are calculated. The erosion profile from the simulation
is compared with the experimental data. The maximum erosion position
corresponds to the place where the magnetic field lines are parallel
to the target surface. |
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Keywords: | magnetron sputtering PIC/MCC sputtering yield |
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