| CVD金刚石薄膜的应力研究 |
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| 引用本文： | 唐壁玉,靳九成.CVD金刚石薄膜的应力研究[J].高压物理学报,1997,11(1):56-60. |
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| 作者姓名： | 唐壁玉 靳九成 |
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| 作者单位： | [1]湖南大学化学化工系 [2]湖南大学测试中心 |
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| 摘 要： | 利用X射线衍射研究了化学气相沉积的金刚石薄膜的应力情况。研究表明：热应力在研究范围内为压应力，本征应力是张应力。分析了薄膜厚度、生长温度、碳源浓度等实验参数对薄膜应力的影响。
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| 关 键 词： | 化学气相沉积 金刚石薄膜 X射线衍射 应力 |
| 收稿时间： | 1996-07-01; |
STUDY ON STRESS IN CHEMICAL VAPOR DEPOSITE(CVD) DIAMOND FILMS |
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| TANG Bi-Yu,Jin Jiu-Cheng,LI Shao-Lü,ZHOU Ling-Ping,CHEN Zong-Zhang.STUDY ON STRESS IN CHEMICAL VAPOR DEPOSITE(CVD) DIAMOND FILMS[J].Chinese Journal of High Pressure Physics,1997,11(1):56-60. |
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| Authors: | TANG Bi-Yu Jin Jiu-Cheng LI Shao-Lü ZHOU Ling-Ping CHEN Zong-Zhang |
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| Institution: | 1. Department of Chemistry and Chemical Engineering, Hunan University, Changsha 410082, China;2. Material Test and Research Center, Hunan University, Changsha 410082, China |
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| Abstract: | The stress in diamond films by the hot filament assisted chemical vapor deposition process was studed by X ray diffraction technique.The investigation shows that the thermal stress is compressive in the temperature range studied and the intrinsic stress is tensile.The influence of various experimental parameters on the stress in films was analysed. |
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| Keywords: | chemical vapor deposition diamond films X ray diffraction stress |
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