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| 亚微米尺寸元件的离子束刻蚀制作 | |
| 引用本文： | 曹召良,陆广,王吉增,杨柏,卢振武,李凤有,任智斌,刘玉玲.亚微米尺寸元件的离子束刻蚀制作[J].光子学报,2003,32(6):653-656. |
| 作者姓名： | 曹召良 陆广 王吉增 杨柏 卢振武 李凤有 任智斌 刘玉玲 |
| 作者单位： | 1. 中国科学院长春光学精密机械与物理研究所,应用光学国家重点实验室,长春,130022 2. 超分子结构与材料教育部重点实验室,吉林大学化学学院,长春,130023 3. 白城师范学院,白城,137000 |
| 基金项目： | 国家自然科学基金 ( 6 0 0 780 0 6 )，教育部博士点基金，中国科学院创新基金资助项目 |
| 摘 要： | 采用软光刻技术中的微接触印刷(μCP)技术、表面诱导的水蒸气冷凝、表面诱导的去湿行为,在金基底上制作出了亚微米的环状周期结构聚合物掩膜.通过对离子束刻蚀过程中各个参量对刻蚀元件的表面光洁度、轮廓保真度和线宽分辨的影响分析,结合掩膜的实际情况选择出了合适的离子束入射角、离子能量、束流密度和刻蚀时间等参量.依照这些参量刻蚀出了高质量的亚微米尺寸环状周期结构元件.通过对刻蚀出的元件的检测发现,刻出的元件表面光洁度、轮廓保真度和侧壁陡峭度都非常好. |
| 关 键 词： | 离子束刻蚀 亚微米 离子能量 束流密度 刻蚀速率 表面光洁度 |
| 收稿时间： | 2002/6/18 |
| 修稿时间： | 2002年6月18日 |
Fabrication of Submicron Elements by Ion Beam Etching |
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| Cao Zhaoliang ,Lu Guang ,Wang Jizeng ,Yang Bai ,Lu Zhenwu ,Li Fengyou ,Ren Zhibin ,Liu Yuling State Key Laboratory of Applied Optics,Changchun Institute of Optics,Fine Mechanics and Physics,Chinese Academy of Sciences,Changchun Key Lab of Supramolecular Structure and Materials of Educational Ministry,College of Chemistry,Jilin University,Changchun Baicheng Normal College,Baicheng.Fabrication of Submicron Elements by Ion Beam Etching[J].Acta Photonica Sinica,2003,32(6):653-656. | |
| Authors: | Cao Zhaoliang Lu Guang Wang Jizeng Yang Bai Lu Zhenwu Li Fengyou Ren Zhibin Liu Yuling State Key Laboratory of Applied Optics Changchun Institute of Optics Fine Mechanics and Physics Chinese Academy of Sciences Changchun Key Lab of Supramolecular Structure and Materials of Educational Ministry College of Chemistry Jilin University Changchun Baicheng Normal College Baicheng |
| Institution: | Cao Zhaoliang 1,Lu Guang 2,Wang Jizeng 3,Yang Bai 2,Lu Zhenwu 1,Li Fengyou 1,Ren Zhibin 1,Liu Yuling 1 1 State Key Laboratory of Applied Optics,Changchun Institute of Optics,Fine Mechanics and Physics,Chinese Academy of Sciences,Changchun 130022 2 Key Lab of Supramolecular Structure and Materials of Educational Ministry,College of Chemistry,Jilin University,Changchun 130023 3 Baicheng Normal College,Baicheng 137000 |
| Abstract: | The microcontact printing(μCP)technique, surface-directed condensation and surface-directed dewetting are used to fabricate the submicron ring periodic polymer mask on gold surface. Then through the analysis of the effects of each parameter on the surface smoothness, profile fidelity and linewidth resolution in the process of ion etching, the suitable angle of incident ion beam, ion energy, density of ion beam and time of etching are selected combining the actual status of the mask. The submicron ring periodic structure is fabricated by ion etching according to the selected parameter. According to the measurement of the element, it is shown that the surface smoothness, profile fidelity and steep sidewall are very well. |
| Keywords: | Ion etching Submicron Ion energy Density of ion beam Etching rate Surface smoothness |
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