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脉宽压缩光栅用多层膜制备和性能测试
引用本文:孔伟金,沈健,沈自才,邵建达,范正修.脉宽压缩光栅用多层膜制备和性能测试[J].光子学报,2006,35(1):84-88.
作者姓名:孔伟金  沈健  沈自才  邵建达  范正修
作者单位:1. 中国科学院上海光学精密机械研究所光学薄膜技术与研究发展中心,上海,201800;中国科学院研究生院,北京,100039
2. 中国科学院上海光学精密机械研究所光学薄膜技术与研究发展中心,上海,201800
基金项目:国家高技术研究发展计划(863计划)
摘    要:给出了以413 nm作为写入波长,1053 nm作为使用波长的多层介质光栅膜的设计,计算表明膜系H3L(H2L)^9H0.5L2.03H满足光栅膜的要求.最后给出了制备得到的样品光学特性测试,结果表明在使用波长和曝光波长处满足设计要求,其抗激光损伤阈值在光正入射和51.2°入射时分别为14.14 J/cm2和9.32 J/cm2,膜系的应力表现为压应力.

关 键 词:多层电介质光栅  膜系设  性能分析
收稿时间:2004-11-01
修稿时间:2004年11月1日

Multi-layer Dielectric Film for Pulse Compressed Gratings
Kong Weijin,Shen Jian,Shen Zicai,Shao Jianda,Fan Zhengxiu.Multi-layer Dielectric Film for Pulse Compressed Gratings[J].Acta Photonica Sinica,2006,35(1):84-88.
Authors:Kong Weijin  Shen Jian  Shen Zicai  Shao Jianda  Fan Zhengxiu
Institution:1 Shanghai Institute of Fine Mechanics and Optics,Chinese Academy of Sciences, Shanghai 201800;2 Graduate school of Chinese Academy of Sciences, Beijing 100039
Abstract:Diffraction efficiency and laser induced damage threshold relay on the optical character,and the laser induced damage character and mechanical character of multiplayer dielectric gratings(MDG) are used in Chirped-pulse amplification. A multi-layer dielectric stack design used at 1053 nm and exposed at 413 nm is given. The analysis show that H3L(H2L)^9H0.5L2.03H meets the requirement of MDG. At last,the optical character of the sample is tested. There is a good agreement between the test of transmittance curve and the design. Laser induced damage thresholds are 14.14 J/cm2 and 9.32 J/cm2 respectively when laser incident vertically and 51.2°. The multi-layer dielectric used in MDG represents compression stress force.
Keywords:Multi-layer dielectric gratings  Thin film stack design  Character analysis
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