| 光刻物镜波像差检测平台移相装置的研制 |
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| 引用本文： | 齐克奇,向阳.光刻物镜波像差检测平台移相装置的研制[J].光子学报,2014,41(12):1452-1455. |
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| 作者姓名： | 齐克奇 向阳 |
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| 作者单位： | 中国科学院长春光学精密机械与物理研究所 应用光学国家重点实验室,长春 130033 |
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| 摘 要： | 针对基于剪切干涉原理的光刻投影物镜波像差检测设备中相移测量的需求,设计了一种移相装置.该装置采用了桥式放大机构,获得了较大放大比和相对紧凑的结构.从原理上对桥式放大机构进行了分析和讨论,得到了输入位移与其放大比之间的函数关系,并得到了其关系曲线.经过非线性有限元分析,对该装置的变形、受力和模态特性进行了验证.验证结果满足检测平台移相要求.
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| 关 键 词： | 光刻投影物镜 波像差 相移测量 桥式放大机构 有限元 |
| 收稿时间： | 2012-07-30 |
Development of Phase-shifting Device of Wavefront Aberration Detecting Stage for Lithographic Projection Objective |
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| QI Ke-qi,XIANG Yang.Development of Phase-shifting Device of Wavefront Aberration Detecting Stage for Lithographic Projection Objective[J].Acta Photonica Sinica,2014,41(12):1452-1455. |
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| Authors: | QI Ke-qi XIANG Yang |
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| Institution: | State Key Laboratory of Applied Optics, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130033, China |
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| Abstract: | To meet the requirement of phase-shifting measurement of the wavefront aberration detecting stage for lithographic projection objective, based on theory of Shearing Interferometry, a phase-shifting device is designed. Bridge amplification mechanism is adopted to obtain a larger amplification ratio and a relatively compact structure. The theory of the bridge amplification mechanism was analyzed and discussed, and the functional relationship and its curve between input displacement and amplification ratio were obtained. To make sure the availability of this structure, nonlinear finite element analysis was proceeded. And the results meet the requirements of phase-shifting device of wavefront aberration detecting stage. |
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| Keywords: | Lithographic projection objective Wavefront aberration Phase-shifting measurement Bridge-type amplification mechanism Finite element method |
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