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蚀刻表面面形的分析
引用本文:张殿文,卢振武,曹召良,李凤友,赵晶丽,裴舒,刘玉玲,王肇圻.蚀刻表面面形的分析[J].光子学报,2002,31(7):887-893.
作者姓名:张殿文  卢振武  曹召良  李凤友  赵晶丽  裴舒  刘玉玲  王肇圻
作者单位:1. 中国科学院长春光学精密机械与物理研究所应用光学国家重点实验室,长春,130021
2. 南开大学现代光学研究所,天津,300071
摘    要:采用一个有效的数学模型,分析了在蚀刻工艺中基底自身面形轮廓的曲线形状对基底局部区域的蚀刻速率产生的影响,并通过对数学模型的理论分析和计算机模拟得出受此影响而产生的面形形状,并将结果与实验进行对比.利用这个数学模型对使用离子束蚀刻制作单台阶光栅的台阶与沟槽部分的表面面形随时间的演变过程进行了计算机模拟分析,并通过把理论结果与在实验中得到的蚀刻表面在原子力显微镜(AFM)下拍摄的照片进行比较,结果说明这种模拟分析能够保证对该问题分析所要求的精度,从而也证明了理论模型的合理性和正确性.

关 键 词:离子束蚀刻  光栅  表面浮雕结构  准单向蚀刻效应
收稿时间:2001/12/31
修稿时间:2001年12月31

ANALYSIS OF THE SURFACE SHAPE IN SOLIDETCHING PROCESS
Zhang Dianwen ,Lu Zhenwu ,Cao Zhaoliang ,Li Fengyou ,Zhao Jingli ,Pei Shu ,Liu Yuling ,Wang Zhaoqi State Key Lab of Applied Optics,Changchun Institute of Optics,Fine Mechanics and Physics,Changchun Institute of Modern Optic.ANALYSIS OF THE SURFACE SHAPE IN SOLIDETCHING PROCESS[J].Acta Photonica Sinica,2002,31(7):887-893.
Authors:Zhang Dianwen  Lu Zhenwu  Cao Zhaoliang  Li Fengyou  Zhao Jingli  Pei Shu  Liu Yuling  Wang Zhaoqi State Key Lab of Applied Optics  Changchun Institute of Optics  Fine Mechanics and Physics  Changchun Institute of Modern Optic
Institution:Zhang Dianwen 1,Lu Zhenwu 1,Cao Zhaoliang 1,Li Fengyou 1,Zhao Jingli 1,Pei Shu 1,Liu Yuling 1,Wang Zhaoqi 2 1 State Key Lab of Applied Optics,Changchun Institute of Optics,Fine Mechanics and Physics,Changchun 130021 2 Institute of Modern Optic
Abstract:To reduce difficulty of analysis,it uses a mathematical model for the surface shape analycis,and give some useful analyses and computer simulations for the ion etching process.Contrasted with the atomic force microscope (AFM) scanning photograph of the etching surface,the theoretical results prove that these simulation analyses assure the precision required by this problem,so these mathematical models are reasonable and correct.The analysis method in this paper is useful to analyze etching process,and it can also afford some valuable reference to etching technology.
Keywords:Ion beam etching  Grating  surface relief  Quasi  directional effect
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