微通道板选通X射线皮秒分幅相机曝光时间的均匀设计

将均匀设计法应用于微通道板选通X射线皮秒分幅相机(MCP－XPFC)曝光时间的研究工作中,目的是找到一个简单高效的试验预估方法来指导分幅相机的研制和试验工作.基于分幅相机皮秒动态选通理论模型,建立了采用0.5 mm厚、长径比40的MCP的皮秒分幅相机选通脉冲参量与曝光时间之间的快速预估模型.利用这一模型得出了相机的曝光时间随选通脉冲脉宽和幅值分别呈抛物线变化,且脉宽和幅值对曝光时间具有交互影响作用.在试验参量范围内,此预估模型能够精确地代替相机理论模型和高效地指导实验.通过实验验证了预估模型,并分析了影响结果的因素.

Uniform Design Method of the Exposure Time of X-ray Picoseconds Framing Camera with Gated Microchannel Plate

The Uniform Design method is applied for the research of the X-ray Picoseconds Framing Camera with gated MCP (micro-channel plate), shortened form MCP-XPFC. On the bases of the theoretical models of picoseconds (ps) voltage pulse gated MCP-XPFC (L=0.5 mm, L/D=40), the fast forecast model of exposure time of MCP-XPFC is put forward. It can accurately replace the theoretical models within the range of experimental parameter and highly enhance the work efficiency. The curves of exposure time versus the width and amplitude of picoseconds high voltage pulse respectively are all the parabola type and there are the interaction on exposure time induced by the width and amplitude of gated pulse. The forecast model is checked by using two groups gated experimental pulses and the error is analyzed at last of this paper.