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In∶Nd∶LiNbO3晶体倍频性能的研究
引用本文:徐朝鹏,许士文,徐悟生,徐玉恒.In∶Nd∶LiNbO3晶体倍频性能的研究[J].光子学报,2005,34(5):778-780.
作者姓名:徐朝鹏  许士文  徐悟生  徐玉恒
作者单位:1. 哈尔滨工业大学电子科学与技术系,哈尔滨,150001
2. 哈尔滨工业大学应用化学系,哈尔滨,150001
基金项目:973项目(G19990330)和863项目(8632001AA31304)资助
摘    要:在 LiNbO3中掺进In2O3和Nd2O3, 以Czochralski技术生长了In∶Nd∶LiNO3晶体. 通过光斑畸变法测得In∶Nd∶LiNbO3晶体的光损伤阈值为1.98×104 W/cm2, 比Nd∶LiNbO3晶体的1.6×102 W/cm2高两个数量级以上;晶体吸收光谱的测试表明, In∶Nd∶LiNbO3晶体的吸收边相对Nd∶LiNbO3晶体发生紫移. 研究了In∶Nd∶LiNbO3晶体的倍频性能, 结果表明, In∶Nd∶LiNbO3晶体的相位匹配温度在室温附近, 倍频转换效率比Nd∶LiNbO3晶体提高二倍.

关 键 词:In∶Nd∶LiNbO3晶体  Czochralski技术  光损伤阈值  倍频性能
收稿时间:2004-09-08
修稿时间:2004年9月8日

Study on Double-Frequency Properties of In: Nd: LiNbO3 Crystals
Xu Zhaopeng,Xu Shiwen,Xu Wusheng,Xu Yuheng.Study on Double-Frequency Properties of In: Nd: LiNbO3 Crystals[J].Acta Photonica Sinica,2005,34(5):778-780.
Authors:Xu Zhaopeng  Xu Shiwen  Xu Wusheng  Xu Yuheng
Institution:(1 Department of Electronic Science and Technology, Harbin Institute of Technology, Harbin 150001)
(2 Department of Applied Chemistry, Harbin Institute of Technology, Harbin 150001)
Abstract:In∶Nd∶LiNbO_3 crystals were grown by Czochralski method with In_2O_3 and Nd_2O_3 as dopants.The optical damage resistance ability of In∶Nd∶LiNbO_3 crystal was investigated by light spot distortion method and the photorefractive threshold of In∶Nd∶LiNbO_3 measured is 1.98×10 4 W/cm 2,two order of magnitude higher than that of Nd∶LiNbO_3 crystal,1.6×10 2 W/cm 2.The structure of the crystals was measured by ultraviolet-visible absorption spectra.The results show that the absorption edge shifted to the ultraviolet band.The double-frequency property of In∶Nd∶LiNbO_3 crystal was measured.The results indicate that the SHG conversation efficiency of In∶Nd∶LiNbO_3 crystals was twice higher than that of Nd-doped LiNbO_3 crystals and the phase matching temperature was near room temperature.
Keywords:In∶Nd∶LiNbO_3  Czochralski method  Photo damage threshold  Double-frequency
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