| RIE精确传递微光学三维结构于红外材料的方法 |
| |
| 引用本文： | 邱传凯,杜春雷.RIE精确传递微光学三维结构于红外材料的方法[J].光子学报,1999,28(9):849-852. |
| |
| 作者姓名： | 邱传凯 杜春雷 |
| |
| 作者单位： | 中国科学院光电技术研究所微细加工光学技术国家重点开放实验室!成都610209，中国科学院光电技术研究所微细加工光学技术国家重点开放实验室!成都610209，中国科学院光电技术研究所微细加工光学技术国家重点开放实验室!成都610209，中国科学院光电技术研究所微细加工光学技术国家 |
| |
| 摘 要： | 本文对红外光学材料锗的蚀刻性能、机制进行了深入的研究,在反应离子蚀刻(RIE)实验基础上,建立了锗材料蚀刻性能与RIE工艺参量的关系,经过大量的实验,找到了稳定蚀刻速率的方法和条件,为用RIE技术形成高精度衍射微光学元件积累了实用经验.
|
| 关 键 词： | 反应离子蚀刻 微浮雕结构 蚀刻率 |
| 收稿时间： | 1999-04-26 |
| 修稿时间： | 1999-04-26 |
THE METHOD FOR TRANSFERRING MICRO OPTICAL PROFILE INTO GERMANIUM ACCURATELY BY RIE |
| |
| Qiu Chuankai,Du Chunlei,Pan Li,Zeng Hongjun,Wang Yongru State lab of Optical Technologies for Microfabrication.THE METHOD FOR TRANSFERRING MICRO OPTICAL PROFILE INTO GERMANIUM ACCURATELY BY RIE[J].Acta Photonica Sinica,1999,28(9):849-852. |
| |
| Authors: | Qiu Chuankai Du Chunlei Pan Li Zeng Hongjun Wang Yongru State lab of Optical Technologies for Microfabrication |
| |
| Institution: | Qiu Chuankai,Du Chunlei,Pan Li,Zeng Hongjun,Wang Yongru State lab of Optical Technologies for Microfabrication,Institute of Optics and Electronics,Chinese Academy of Sciences,Chengdu 610209 Received date:1999-04-26 |
| |
| Abstract: | The etching mechanism and properties for germanium has been studied in this paper.A relationship between material properties and etching parameters was established.An optimizing technique method has been proposed based on a lot of experiment results,5% of the etching rate repeatability was achieved for germainum.A micro optical elements of 16 phase steps was fabricated with accurate phase depth. |
| |
| Keywords: | Reactive ion etching Micro relief profile Etching rate |
| 本文献已被 CNKI 维普 等数据库收录！ |
| 点击此处可从《光子学报》浏览原始摘要信息 |
| 点击此处可从《光子学报》下载免费的PDF全文 |
|
