| 两种方法制备ITO薄膜的红外特性分析 |
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| 引用本文： | 周平,黄昱勇,林宇翔,李海峰,刘旭,顾培夫.两种方法制备ITO薄膜的红外特性分析[J].光子学报,2002,31(8):985-988. |
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| 作者姓名： | 周平 黄昱勇 林宇翔 李海峰 刘旭 顾培夫 |
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| 作者单位： | 浙江大学现代光学国家重点实验室,杭州,310027 |
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| 基金项目： | 国家自然科学基金资助项目 (编号 :6 9976 0 2 6 ) |
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| 摘 要： | 比较了用电束加热蒸发法和直流磁控溅射法制备的氧化锡铟(ITO)薄膜在红外波段的光学特性实验发现,通过直流磁控溅射在常温下制备的ITO薄膜在红外波段折射率稳定、消光系数小,比电子束加热蒸发制备的膜有较高的透过率在波长1550nm附近的透过率可达86%以上,消光系数约为004,方电阻最低为100Ω/□.
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| 关 键 词： | ITO薄膜 光学特性 磁控溅射 电子束加热蒸发 |
| 收稿时间： | 2001/12/11 |
| 修稿时间： | 2001年12月11 |
CHARACTERISTICS ANALYZE OF ITO THIN FILMS DEVELOPED BY TWO METHODS IN INFRARED BAND |
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| Zhou Ping,Huang Yuyong,Lin Yuxiang,Li Haifeng,Liu Xu,Gu Peifu State Key Laboratory of Modern Optical Instrument,Zhejiang University,Hangzhou.CHARACTERISTICS ANALYZE OF ITO THIN FILMS DEVELOPED BY TWO METHODS IN INFRARED BAND[J].Acta Photonica Sinica,2002,31(8):985-988. |
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| Authors: | Zhou Ping Huang Yuyong Lin Yuxiang Li Haifeng Liu Xu Gu Peifu State Key Laboratory of Modern Optical Instrument Zhejiang University Hangzhou |
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| Institution: | Zhou Ping,Huang Yuyong,Lin Yuxiang,Li Haifeng,Liu Xu,Gu Peifu State Key Laboratory of Modern Optical Instrument,Zhejiang University,Hangzhou 310027 |
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| Abstract: | The performance differences between indium-tin-oxide(ITO)thin films developed by magnetron sputtering and those by e-beam evaporation are compared.It is found that the ITO thin films developed by magnetron sputtering in room temperature has smaller extinction coefficient and more stable index in infrared band.The transmittance of ITO thin films developed by sputtering could reach 86% around 1550nm,and the square resistance could be reduced to 100Ω/□.Such a kind of ITO thin films has wide application in optical communication. |
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| Keywords: | ITO thin film Optical properties Magnetron sputtering E beam evaporation |
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