| 离子束溅射沉积Ir膜真空紫外反射特性研究 |
| |
| 引用本文： | 干蜀毅,刘正坤,盛斌,徐向东,洪义麟,刘颍,周洪军,霍同林,付绍军.离子束溅射沉积Ir膜真空紫外反射特性研究[J].光子学报,2009,38(5):1207-1211. |
| |
| 作者姓名： | 干蜀毅 刘正坤 盛斌 徐向东 洪义麟 刘颍 周洪军 霍同林 付绍军 |
| |
| 作者单位： | 1. 中国科技大学,国家同步辐射实验室,合肥,230029;合肥工业大学,真空教研室,合肥,230009
2. 中国科技大学,国家同步辐射实验室,合肥,230029 |
| |
| 摘 要： | 根据吸收材料基底上单层金属膜数学计算模型，对不同基片上各种厚度的Ir膜真空紫外反射率进行了优化计算.采用离子束溅射沉积技术，在石英、K9玻璃和Si基片上沉积了不同厚度的Ir膜，研究了基片、表面厚度、离子束能量及镀后热处理对Ir膜反射率的影响，在波长120 nm处获得了近30％正入射反射率.
|
| 关 键 词： | 真空紫外反射膜 真空紫外反射率 Ir膜 离子束溅射 |
| 收稿时间： | 2008-01-25 |
| 修稿时间： | 2008-03-04 |
Reflectance of Ir Layer in Vacuum Ultraviolet Wavelength Region Deposited by Ion Beam Sputtering |
| |
| GAN Shu-yi,LIU Zheng-kun,SHENG Bin,XU Xiang-dong,HONG Yi-lin,LIU Ying,ZHOU Hong-jun,HUO Tong-lin,FU Shao-jun.Reflectance of Ir Layer in Vacuum Ultraviolet Wavelength Region Deposited by Ion Beam Sputtering[J].Acta Photonica Sinica,2009,38(5):1207-1211. |
| |
| Authors: | GAN Shu-yi LIU Zheng-kun SHENG Bin XU Xiang-dong HONG Yi-lin LIU Ying ZHOU Hong-jun HUO Tong-lin FU Shao-jun |
| |
| Institution: | 1 National Synchrotron Radiation Laboratory;University of Science and Technology of China;Hefei 230029;China;2 Department of Mechanical and Automobile Engineering;Hefei University of Technology;Hefei 230009;China |
| |
| Abstract: | Based on the theoretical model of single metal layer on Absorbing substrate,the thickness optimum calculation was performed for Ir layer on Bk7,quartz glass and Si substrate in the vacuum ultravialet(VUV) wavelength region.Single layer Ir films of different thicknesses were fabricated on those substrates by ion beam sputtering technique(IBS).The influence of substrate,layer thickness,ion beam energy and post-annealing on the reflectance were investigated,and nearly 30% normal incident reflectance at 120 nm ... |
| |
| Keywords: | VUV reflecting layer VUV reflectance Ir film IBS |
| 本文献已被 CNKI 维普 万方数据 等数据库收录！ |
| 点击此处可从《光子学报》浏览原始摘要信息 |
| 点击此处可从《光子学报》下载免费的PDF全文 |
|
