| 磁控溅射参数对NiOx薄膜光学常数的影响 |
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| 引用本文： | 李小刚,唐晓东.磁控溅射参数对NiOx薄膜光学常数的影响[J].光子学报,2009,38(2):302-306. |
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| 作者姓名： | 李小刚 唐晓东 |
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| 作者单位： | 1. 中国科学院上海光学精密机械研究所,上海,201800
2. 华东师范大学,电子工程系,上海,200062 |
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| 基金项目： | Supported by the Technology Development Program of Shanghai Municipal Science and Technology Commission(06DJ14007) |
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| 摘 要： | 采用反应性磁控溅射法制备了NiOx薄膜,并结合椭圆偏振仪、XRD和XPS研究了溅射参量对其光学常量的影响.NiOx薄膜的光学常量随着O2/Ar流量比的增大而减小；热退火后,折射率增大而消光系数下降了50%；溅射功率越大折射率也越大,而工作气压越大折射率反而越小.这些变化分别与薄膜中存在间隙O和Ni空位、NiOx分解以及NiOx薄膜的致密度有关.
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| 关 键 词： | 光学常数 NiOx薄膜 溅射参数 |
| 收稿时间： | 2007-10-11 |
| 修稿时间： | 2007-11-02 |
Effects of Sputtering Parameters on Optical Constant of NiO_x Thin Films |
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| LI Xiao-gang,TANG Xiao-dong.Effects of Sputtering Parameters on Optical Constant of NiO_x Thin Films[J].Acta Photonica Sinica,2009,38(2):302-306. |
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| Authors: | LI Xiao-gang TANG Xiao-dong |
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| Institution: | 1 Shanghai Institute of Optics and Fine Mechanics;Chinese Academy of Sciences;Shanghai 201800;China;2 Department of Electronic Engineering;East China Normal University;Shanghai 200062;China |
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| Abstract: | The effects of sputtering parameters on optical constant of NiOx thin films prepared by reactive magnetron sputtering were studied by spectroscopic ellipsometry, XRD and XPS methods. The optical constant of the deposited films became smaller with O2/Ar flow ratios increasing. After annealing, the refractive index shows an increase, especially at a high O2/Ar flow ratio, while the extinction coefficient reduced by about 50%. The refractive index is greater for a higher sputtering power while smaller for a higher work pressure. It is related to the existence of interstitial oxygen and vacancy of Ni, the decomposition of NiOx and compactness degree of NiOx films, respectively. |
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| Keywords: | Optical constant NiOx Thin films Spurtting parameters |
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