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磁控溅射法制备二氧化钒薄膜最佳参量的研究
引用本文:刘金城,鲁建业,田雪松,掌蕴东,袁萍,贾晓玲,王骐.磁控溅射法制备二氧化钒薄膜最佳参量的研究[J].光子学报,2003,32(1):65-67.
作者姓名:刘金城  鲁建业  田雪松  掌蕴东  袁萍  贾晓玲  王骐
作者单位:哈尔滨工业大学光电子技术研究所,哈尔滨,150001
摘    要:用X射线电子能谱仪(XPS)对不同条件下用磁控溅射法制备的VO2薄膜进行测试,得到VO2薄膜内部组成成份的信息.研究了获得高含量VO2薄膜的最佳制备参量.同时还观察到V2O3、VO2、V2O5以接近含量共存的现象,这与以前研究所给出的薄膜几乎只由V2O3、VO2、V2O5中的两种组成的结论有所不同.

关 键 词:磁控溅射  二氧化钒  制备参量
收稿时间:2002/1/14
修稿时间:2002年1月14日

The Study of Optimizing Parameters in Preparing VO2 Films by Magnetron Sputtered Method
Liu Jincheng,Lu Jianye,Tian Xuesong,Zhang Yundong,Yuan Ping,Jia Xiaoling,Wang Qi Institute of Optronics,Harbin Institute of Technology,Harbin Received date:.The Study of Optimizing Parameters in Preparing VO2 Films by Magnetron Sputtered Method[J].Acta Photonica Sinica,2003,32(1):65-67.
Authors:Liu Jincheng  Lu Jianye  Tian Xuesong  Zhang Yundong  Yuan Ping  Jia Xiaoling  Wang Qi Institute of Optronics  Harbin Institute of Technology  Harbin Received date:
Institution:Liu Jincheng,Lu Jianye,Tian Xuesong,Zhang Yundong,Yuan Ping,Jia Xiaoling,Wang Qi Institute of Optronics,Harbin Institute of Technology,Harbin 150001 Received date:20020114
Abstract:VO2 thin films are prepared by RF magnetron sputtering in different conditions. According to the XPS investigation, composition data of the interior VO2 thin films are achieved. The optimization parameters have been studied.V2O3、VO2 and V2O5 exist at nearly equal constant is observed in the experiment. It is somewhat different with the results given by former bibliography, that the film is composed only by every two of V2O3、VO2 and V2O5.
Keywords:Magnetron sputtered  VO  2  Optimization parameter
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