| 金属-电介质多层膜结构亚波长成像特性分析(英文) |
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| 引用本文： | 郑改革,蒋立勇,强海霞,李相银.金属-电介质多层膜结构亚波长成像特性分析(英文)[J].光子学报,2009,38(8). |
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| 作者姓名： | 郑改革 蒋立勇 强海霞 李相银 |
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| 作者单位： | 南京理工大学,理学院,南京,210094 |
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| 摘 要： | 分析了由Ag和Si3N4多层纳米薄膜组成的特异材料的模式特性,使用本征模展开法(EME)结合完全匹配层(PML)边界条件模拟了该结构的亚波长成像行为,在法布里-珀罗(Fabry-Perot)条件(结构的长度是半波长的整数倍)条件下,研究发现邻近系统的点源会在另一侧成实像,这种成像基于自准直而并不是负折射.研究结果证实了金属-电介质多层膜结构可以在光波段实现近场成像.
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| 关 键 词： | 亚波长成像 自准直 金属-电介质多层膜 本征模展开法 Sselfcollimation |
Subwavelength Imaging Properties of Multilayered Metallodielectric Nanofilms |
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| ZHENG Gai-ge,JIANG Li-yong,QIANG Hai-xia,LI Xiang-yin.Subwavelength Imaging Properties of Multilayered Metallodielectric Nanofilms[J].Acta Photonica Sinica,2009,38(8). |
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| Authors: | ZHENG Gai-ge JIANG Li-yong QIANG Hai-xia LI Xiang-yin |
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| Institution: | School of Sciences;Nanjing University of Science and Technology;Nanjing 210094;China |
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| Abstract: | The characteristics of a metamaterial consisting of multilayered Ag/Si3N4 nanofilms are studied and the eigen mode expansion(EME)method is used to demonstrate the subwavelength imaging effect.A point source placed in the vicinity of the structure can form a image in the opposite side of the slab,the impedance match is not necessary since the Fabry-Perot condition is fulfiled(the thickness of the structure is an integer number of half-wavelengths)and the reflections from the interfaces are almost eliminated.... |
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| Keywords: | Subwavelength imaging Metallodielectric nanofilms Eigen-mode expansion method |
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