首页 | 本学科首页   官方微博 | 高级检索  
     检索      

高分辨率衍射图形的DMD并行激光干涉直写
引用本文:吴智华,魏国军,周小红,邵洁,陈林森.高分辨率衍射图形的DMD并行激光干涉直写[J].光子学报,2008,37(9):1784-1787.
作者姓名:吴智华  魏国军  周小红  邵洁  陈林森
作者单位:苏州大学,信息光学工程研究所,江苏,苏州,215006
基金项目:国家高技术研究发展计划(863计划)
摘    要:通过将数字微反射镜(Digital Micro-mirror Device,DMD)输入阵列图形微缩干涉成像,激光干涉直写系统在光刻胶板上得到缩小的干涉光斑图形,像素特征尺寸3.5 μm,干涉条纹周期1 μm.控制刻蚀深度、干涉条纹取向和DMD输入图形的结构,系统能数字化完成2D/3D、3D光变图像、超微图形文字以及二元光学元件的制作,实现了超高分辨率图形与高效的干涉光刻.给出了实验结果.

关 键 词:并行激光直写  二元光学  数字光变图像  数字微反射镜
收稿时间:2007-06-14
修稿时间:2007-07-24

Approach of High Resolution Diffraction Patterns with DMD Laser Direct Interferential Writing System
WU Zhi-hua,WEI Guo-jun,ZHOU Xiao-hong,SHAO Jie,CHEN Lin-sen.Approach of High Resolution Diffraction Patterns with DMD Laser Direct Interferential Writing System[J].Acta Photonica Sinica,2008,37(9):1784-1787.
Authors:WU Zhi-hua  WEI Guo-jun  ZHOU Xiao-hong  SHAO Jie  CHEN Lin-sen
Abstract:The input micro-patterns in the digital micro-mirror device(DMD) are imaged on the photoresist plate using reduction interferential optical devices in the laser direct writing system.The feature size of pixels on the formed diffraction patterns is 3.5 μm,and the period of interferential fringes in the pixels is 1 μm.The high resolution 2D/3D,kinetic 3D,micro-texts and binary optical devices can be fabricated with the mentioned system by controlling the exposure,the direction of interferential fringes and the structures of input patterns of DMD.The results show that the high quality diffraction patterns can be achieved digitally and efficiently.The experimental results are given.
Keywords:Parallel laser direct writing  Binary optical element  OVD  DMD
本文献已被 维普 万方数据 等数据库收录!
点击此处可从《光子学报》浏览原始摘要信息
点击此处可从《光子学报》下载免费的PDF全文
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号