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镜面起伏对1.55μm Si基MEMS光滤波器的影响
引用本文:左玉华,毛容伟,黄昌俊,蔡晓,李传波,成步文,罗丽萍,高俊华,白云霞,姜磊,马朝华,王良臣,余金中,王启明.镜面起伏对1.55μm Si基MEMS光滤波器的影响[J].光子学报,2003,32(6):661-664.
作者姓名:左玉华  毛容伟  黄昌俊  蔡晓  李传波  成步文  罗丽萍  高俊华  白云霞  姜磊  马朝华  王良臣  余金中  王启明
作者单位:中国科学院半导体研究所集成光电子国家重点实验室,北京,100083
基金项目:国家重点基础研究发展规划(973项目)G2 0 0 0 0 36 6 0 3,自然科学基金重大课题 (No .96 10 4 0 0 3),863项目2 0 0 2AA312 0 10资助项目
摘    要:用传输矩阵方法,在简化的光学模型基础上,分别讨论了分布式Bragg反射镜DBR(Distributed Bragg Reflector)的生长精度及镜面起伏对1.55 μm Si基MEMS(Micro-Electro-Mechanical-System)可调谐光滤波器透射谱的影响.计算表明:DBR生长误差仅使主透射峰位置发生变化,而镜面起伏是导致主透射峰性能劣化的主要原因,它使得FWHM增大,透射峰强度下降.理论计算结果能较好地解释实验现像.在此基础上,进一步讨论了引起镜面起伏的多种原因,并提出了可能的解决方法.

关 键 词:可调谐光滤波器  Fabry-Perot  镜面起伏
收稿时间:2002/8/17
修稿时间:2002年8月17日

The Effect of Mirror Undulation on Optical Property of Si-base MEMS Optical Tunable Filter
Zuo Yuhua,Mao Rongwei,Huang Changjun,Cai Xiao,Li Chuanbo,Cheng Buwen,Luo Liping,Gao Junhua,Bai Yunxia,Jiang Lei,Ma Chaohua,Wang Liangchen,Yu Jinzhong,Wang Qiming State Key Laboratory on Integrated Optoelectroncis.The Effect of Mirror Undulation on Optical Property of Si-base MEMS Optical Tunable Filter[J].Acta Photonica Sinica,2003,32(6):661-664.
Authors:Zuo Yuhua  Mao Rongwei  Huang Changjun  Cai Xiao  Li Chuanbo  Cheng Buwen  Luo Liping  Gao Junhua  Bai Yunxia  Jiang Lei  Ma Chaohua  Wang Liangchen  Yu Jinzhong  Wang Qiming State Key Laboratory on Integrated Optoelectroncis
Institution:Zuo Yuhua,Mao Rongwei,Huang Changjun,Cai Xiao,Li Chuanbo,Cheng Buwen,Luo Liping,Gao Junhua,Bai Yunxia,Jiang Lei,Ma Chaohua,Wang Liangchen,Yu Jinzhong,Wang Qiming State Key Laboratory on Integrated Optoelectroncis,Institute of Semiconductors,Chinese Academy of Sciences,Beijing 100083,China
Abstract:The prototype 1.55 μm Si-based MEMS tunable optical filter was fabricated,using surface micromachined technology. Based on the Gaussian model of the filter cavity, the effect of the deviation in the mirror fabrication and the cavity length on the static optical property of the filter has been investigated,using transfer matrix method. It is found that the deviation of the mirror thickness affect the position of the transmittance peak,and has no effect on its FWHM and intensity; by contrast, the cavity length undulation has great influence on the quality of the main transmittance peak, widening its FWHM and decreasing its intensity. The model can explain the experimental transmittance curve quite well. The possible problems in the fabrication process have been discussed and potential ways to relieve the mirror undulation offered.
Keywords:Tunable optical filter  Fabry  Perot  Mirror undulation
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