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ZnO-SnO2透明导电薄膜的制备及性能研究
引用本文:王峰,张志勇,阎军峰,李林,贠江妮.ZnO-SnO2透明导电薄膜的制备及性能研究[J].光子学报,2014,38(12):3121-3125.
作者姓名:王峰  张志勇  阎军峰  李林  贠江妮
作者单位:(西北大学 信息科学与技术学院,西安 710127)
基金项目:西安市应用材料创新基金(XA-AM-200712)和西北大学研究生创新教育资助项目(08YJC11)资助
摘    要:采用二步成胶工艺制备ZnO-SnO2透明导电薄膜,应用X射线衍射、原子力显微镜、紫外-可见分光光度计、薄膜分析仪及四探针仪等对薄膜的结构、表面微观形貌、透过率和导电性能进行表征.结果表明,锌锡摩尔比为9/12,退火温度为500 ℃时,薄膜的透过率达90%,电阻率为3.15×10-3 Ω·cm.与其它工艺相比,二步成胶工艺所制备出的ZnO-SnO2透明导电薄膜性能优异.

关 键 词:二步法  ZnO-SnO2  锌锡摩尔配比  透明导电薄膜
收稿时间:2009-01-13

Preparation and Characterization of ZnO-SnO2 Transparent and Conducting Thin Film
WANG Feng,ZHANG Zhi-Yong,YAN Jun-Feng,LI Lin,YUN Jiang-Ni.Preparation and Characterization of ZnO-SnO2 Transparent and Conducting Thin Film[J].Acta Photonica Sinica,2014,38(12):3121-3125.
Authors:WANG Feng  ZHANG Zhi-Yong  YAN Jun-Feng  LI Lin  YUN Jiang-Ni
Institution:(School of Information Science and Technology,Northwest University,Xi′an 710127,China)
Abstract:Transparent and conducting polycrystalline oxide thin films of ZnO-SnO2 are prepared on glass subsrate by the process of gelatination in two-step.The crystalline structure of the thin film, surface morphology, optical transmittance and conductivity are characterized by X-ray diffraction(XRD), Atomic force microscope(AFM), Spectrophotometeric analysis(UV-Vis),device of film analysis and Four-point probes, respectively.The results indicate that the transparent conducting thin film with Zn/Sn=9/12 has the optimal performance at the annealing tempareture of 500 ℃ and the ultraviolet-visible light transmittance reached 90% with 3.15×10-3 Ω·cm resistance.Compared with other methods,transparent and conducting thin films of ZnO-SnO2 prepared by gelatination in two-step has excellent characteristics.
Keywords:Gelatination in two-step  ZnO-SnO2  Moore ratio of zinc and stannum  Transparent and conducting thin film
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