| 低陡度光刻胶光栅槽形研究 |
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| 引用本文： | 刘全,万华,吴建宏,陈新荣,李朝明.低陡度光刻胶光栅槽形研究[J].光子学报,2008,37(7):1401-1405. |
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| 作者姓名： | 刘全 万华 吴建宏 陈新荣 李朝明 |
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| 作者单位： | 1. 苏州大学,信息光学工程研究所,苏州,215006
2. 中国人民解放军总参第60研究所,南京,210016 |
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| 基金项目： | 国家863高技术研究与发展计划和苏州大学青年教师研究基金 |
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| 摘 要： | 为控制全息光刻胶光栅槽形,从研究显影时间、显影液温度等对光刻胶特性曲线的影响出发,采用计算机模拟和实验方法,制作出底部占宽比30%左右,陡度65°左右的低陡度光刻胶光栅掩模.研究发现：启动曝光量随显影时间的延长而减小,光刻胶特性曲线线性部分的斜率随着显影时间的增加而增加；显影液温度高的光刻胶启动曝光量大,其特性曲线线性部分的斜率也较大.这决定了制作低陡度光刻胶光栅掩模需要使用非1∶1的干涉曝光,以及必须采用较低温度的显影液进行显影处理.最终选用1∶7的干涉曝光和15℃的显影液.
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| 关 键 词： | 衍射光学 全息 光刻胶光栅掩模 槽形控制 |
| 收稿时间： | 2007-06-13 |
| 修稿时间： | 2007-08-15 |
Research on Acquisition of Low Gradient Photoresist Gratings |
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| LIU Quan,WAN Hua,WU Jian-hong,CHEN Xin-rong,LI Chao-ming.Research on Acquisition of Low Gradient Photoresist Gratings[J].Acta Photonica Sinica,2008,37(7):1401-1405. |
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| Authors: | LIU Quan WAN Hua WU Jian-hong CHEN Xin-rong LI Chao-ming |
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| Abstract: | The control of the profile of holographic photoresist gratings is investigated.Considering the effects of developing time and temperature of the developer on the response of photoresist,the 1∶7 interferential exposure and 15℃- development have been adopted.A low gradient photoresist grating:30% duty cycle at bottom and 65° gradient can be fabricated.The result indicates that the increase of the developing time causes the decrease of the threshold volume of exposure while the increase of the slope of the linearity of photoresist response,and the rise of the temperature of the developer leads to both the increase of the threshold volume of exposure and the slope of the linearity of photoresist response.As a result non-1∶1 interferential exposure and low-temperature development are required in the fabrication of low gradient photoresist grating masks. |
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| Keywords: | Diffractive optics Holography Photoresist grating masks Control of the profile |
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