红外微透镜阵列及其与MCT红外焦平面的集成

针对中短波碲镉汞（MCT）红外焦平面探测器的使用要求，设计了用于混合集成和单片集成且尺寸大小与探测器像元结构匹配的方形底折射微透镜阵列。采用热熔成形和（反应）离子柬刻蚀转移技术制作了多种红外材料微透镜，如Si、Ge、GaAs、蓝宝石以及红外玻璃（IRG-103和IRG-104）微透镜。针对混合集成和单片集成的不同要求，选用多种光刻胶如AZ6112和AZ6130等不同厚度的胶以及SUN-120P低熔点正型光刻胶，进行热熔和刻蚀实验，遴选分别适用于混合和单片集成的光刻胶。优化光刻胶和衬底材料的刻蚀速率比，得到高填充因子和合适光学参数的微透镜阵列。探究了SUN-120P低熔点正型光刻胶的特性和通过离子柬刻蚀转移视线实现零间距透镜的工艺。最后介绍了与MCT红外焦平面阵列器件的集成方式和工艺进展。

Infrared Microlens Array and its Integration with Infrared Imaging Detectors

By using thermal reflow technology and （reactive） ion beam etching transfer technology, a wide range of infrared mierolenses based on Si, Ge, GaAs, sapphire and infrared glass （IRG-103 and IRG-104） have been fabricated. Thermal re- flow is achieved on a variety of photoresists such as AZ6112, AZ6130 and low melting positive type photoresist-SUN-120R Optimization of etch rate ratio between the photoresist and suhstrate material, get high fill factor and a suitable optical pa- rameters of the micro lens array. The feasibility of low melting positive type photoresist SUN-120P is explored. Zero gap distance is achieved by ion beam etching process. Finally, the integrated manner and process progress about the mercury cadmium telluride （MCT） infrared focal plane array device are introduced.