| 同步辐射掠出射X射线荧光分析薄膜膜厚 |
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| 引用本文： | 巩岩,陈波,尼启良,崔明启,赵屹东,吴忠华.同步辐射掠出射X射线荧光分析薄膜膜厚[J].中国物理 C,2005,29(11):1104-1106. |
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| 作者姓名： | 巩岩 陈波 尼启良 崔明启 赵屹东 吴忠华 |
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| 作者单位： | [1]应用光学国家重点实验室,中国科学院长春光学精密机械与物理研究所,长春130033 [2]中国科学院高能物理研究所,北京100049 |
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| 基金项目： | 应用光学国家重点实验室基金（DA00Q02D）资助 |
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| 摘 要： | 掠射X射线荧光分析为薄层和多层膜特性分析提供了潜在的可能. 尤其是可以探测膜层厚度、界面形貌和组成. 以北京同步辐射光源作激发光源, 采用掠出射方法测试了Si基片上不同厚度的单层Cr膜样品, 测试结果与理论计算基本符合. 同时观察到一定厚度的薄膜样品产生的掠出射X射线荧光的干涉现象.
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| 关 键 词： | 同步辐射光源 掠出射 X射线荧光 薄膜 |
| 收稿时间： | 2005-01-11 |
| 修稿时间： | 2005-01-112005-04-16 |
Thickness Analysis for Thin-Film by Glazing Exit X-ray Fluorescence with Synchrotron Radiation Source |
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| GONG Yan,CHEN Bo, NI Qi-Liang,CUI Ming-Qi,ZHAO Yi-Dong, WU Zhong-Hua.Thickness Analysis for Thin-Film by Glazing Exit X-ray Fluorescence with Synchrotron Radiation Source[J].High Energy Physics and Nuclear Physics,2005,29(11):1104-1106. |
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| Authors: | GONG Yan CHEN Bo NI Qi-Liang CUI Ming-Qi ZHAO Yi-Dong WU Zhong-Hua |
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| Institution: | 1.State Key Lab of Applied Optics, the Institute of Optics, Fine Mechanics and Physics, CAS, Changchun 130033, China; 2 .Institute of High Energy Physics, CAS, Beijing 100049, China |
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| Abstract: | The grazing exit X-ray fluorescence provides a possibility to analyze the characteristics of thin film and multilayer, especially the thickness, interface structure and composition. The Cr film samples with different thickness deposited on silicon (Si) bases are tested with grazing method using Beijing synchrotron radiation source (SR) as excitation light. The results agree with the theoretical prediction, and the interference of emitted X-ray has been observed. |
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| Keywords: | synchrotron radiation source glazing exit X-ray fluorescence thin film |
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