| Analysis of the Aberration in Directly-writing Atom Lithography |
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| 作者姓名： | LI Chuanwen CAI Weiquan WANG Yuzhu |
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| 作者单位： | Laboratory for Quantum Optics，Shanghai Institute of Optics and Fine Mechanics，The Chinese Academy of Sciences，Shanghai 201800，China |
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| 基金项目： | National Natural Science Foundation of China (grant No.69678009 and 19774060) and the Science and Technique Development Foundation of Shanghai,China. |
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| 摘 要： | 1 Ｉｎｔｒｏｄｕｃｔｉｏｎ ＳｉｎｃｅＧ．Ｔｉｍｐ＇ｓｇｒｏｕｐｏｂｓｅｒｖｅｄｌｉｇｈｔｄｉｆｆｒａｃｔｉｏｎｆｒｏｍｃｈａｎｎｅｌｉｚｅｄａｔｏｍｓｉｎ1992［1］，ｌｉｔｈｏｇｒａｐｈｙｗｉｔｈＮａ，Ｃｒ，ａｎｄＡｌａｔｏｍｉｃｂｅａｍｈａｓｂ...
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| 收稿时间： | 1999/4/12 |
Analysis of the Aberration in Directly writing Atom Lithography |
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| LI Chuanwen,CAI Weiquan,WANG Yuzhu.Analysis of the Aberration in Directly-writing Atom Lithography[J].中国激光(英文版),2000,9(1):75-78. |
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| Authors: | LI Chuanwen CAI Weiquan WANG Yuzhu |
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| Abstract: | After deriving the approximation solution which describes the motion of neutral atoms in an optical standing wave field with large detuning, the spherical aberration and the chromatic aberration are analyzed and possible methods to reduce these aberrations are discussed. |
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| Keywords: | atom lithography spherical aberration chromatic aberration |
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