Electron beam induced effects on gas adsorption utilizing auger electron spectroscopy: Co and O2 on Si: I. Adsorption studies |
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| Authors: | RE Kirby D Lichtman |
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| Institution: | Physics Department and the Laboratory for Surface Studies, University of Wisconsin-Milwaukee, Milwaukee, Wisconsin 53201, U.S.A. |
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| Abstract: | The effect of electron beam monitored gas adsorption on the clean Si surface is studied using Auger electron spectroscopy. It is shown that the beam affects the AES adsorption signal of CO and O2 on Si by dissociating the adsorbed molecules on the surface and subsequently promoting diffusion of atomic oxygen into the bulk. A qualitative explanation of the adsorption data is presented and the initial sticking probability of O2 on Si (111) surface is estimated to be S0 = 0.21. |
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