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Hydroxylated α-Al2O3 (0 0 0 1) surfaces and metal/α-Al2O3 (0 0 0 1) interfaces
Authors:Qiang Fu  Thomas Wagner  Manfred Rühle
Institution:a Max-Planck-Institut für Metallforschung, Heisenbergstrasse 3, D-70569 Stuttgart, Germany
b State Key Laboratory of Catalysis, Dalian Institute of Chemical Physics, The Chinese Academy of Sciences, Zhongshan Road 457, Dalian 116023, PR China
Abstract:X-ray photoelectron spectroscopy was applied to study the hydroxylation of α-Al2O3 (0 0 0 1) surfaces and the stability of surface OH groups. The evolution of interfacial chemistry of the α-Al2O3 (0 0 0 1) surfaces and metal/α-Al2O3 (0 0 0 1) interfaces are well illustrated via modifications of the surface O1s spectra. Clean hydroxylated surfaces are obtained through water- and oxygen plasma treatment at room temperature. The surface OH groups of the hydroxylated surface are very sensitive to electron beam illumination, Ar+ sputtering, UHV heating, and adsorption of reactive metals. The transformation of a hydroxylated surface to an Al-terminated surface occurs by high temperature annealing or Al deposition.
Keywords:X-ray photoelectron spectroscopy  Molecular beam epitaxy  Metallic films  Aluminum oxide  Metal-oxide interfaces  Surface chemical reactions
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