Hydroxylated α-Al2O3 (0 0 0 1) surfaces and metal/α-Al2O3 (0 0 0 1) interfaces |
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Authors: | Qiang Fu Thomas Wagner Manfred Rühle |
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Institution: | a Max-Planck-Institut für Metallforschung, Heisenbergstrasse 3, D-70569 Stuttgart, Germany b State Key Laboratory of Catalysis, Dalian Institute of Chemical Physics, The Chinese Academy of Sciences, Zhongshan Road 457, Dalian 116023, PR China |
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Abstract: | X-ray photoelectron spectroscopy was applied to study the hydroxylation of α-Al2O3 (0 0 0 1) surfaces and the stability of surface OH groups. The evolution of interfacial chemistry of the α-Al2O3 (0 0 0 1) surfaces and metal/α-Al2O3 (0 0 0 1) interfaces are well illustrated via modifications of the surface O1s spectra. Clean hydroxylated surfaces are obtained through water- and oxygen plasma treatment at room temperature. The surface OH groups of the hydroxylated surface are very sensitive to electron beam illumination, Ar+ sputtering, UHV heating, and adsorption of reactive metals. The transformation of a hydroxylated surface to an Al-terminated surface occurs by high temperature annealing or Al deposition. |
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Keywords: | X-ray photoelectron spectroscopy Molecular beam epitaxy Metallic films Aluminum oxide Metal-oxide interfaces Surface chemical reactions |
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