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Formation of carbon-induced dimer vacancy defects on Si(0 0 1)-2 × 1 by thermal decomposition of organic molecules-lack of dependence on the molecules’ structure
Authors:T Suzuki  J Levy
Institution:a Surface Science Center, Department of Chemistry, University of Pittsburgh, Pittsburgh, PA 15260, United States
b Department of Physics and Astronomy, University of Pittsburgh, Pittsburgh, PA 15260, United States
Abstract:Two large and complex adsorbed organic molecules, coronene (C24H12) and C60, have been used to produce Si dimer vacancy defects on Si(0 0 1) by thermal decomposition. Studies by STM show that the aligned structural arrangement of the dimer vacancy defects produced is independent of the chemical structure of the organic molecules. This indicates that the chemistry of the thermally decomposed carbon species produced by decomposition of the organic molecule controls the organization of the Si dimer vacancy defects. It is found that ∼1 C atom is responsible for each dimer vacancy defect for both molecules in accordance with earlier studies of C2H2 decomposition on Si(0 0 1).
Keywords:Auger electron spectroscopy  Scanning tunneling microscopy  Compound formation  Nanopatterning  Surface chemical reaction  Silicon  Silicon carbide
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