Effects of substrate temperature and oxygen pressure on the magnetic properties and structures of CoFe2O4 thin films prepared by pulsed-laser deposition |
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Authors: | Jian-ping Zhou Hong-cai He |
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Institution: | a School of Physics and Information Technology, Shaanxi Normal University, Xi’an 710062, People's Republic of China b State Key Lab of New Ceramics and Fine Processing, and Department of Materials Science and Engineering, Tsinghua University, Beijing 100084, People's Republic of China |
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Abstract: | CoFe2O4 thin films were grown on silicon substrates by pulsed-laser deposition techniques at various temperatures from 350 °C to 700 °C and different pressures from 0.1 Pa to 10 Pa. The CoFe2O4 films with highly (1 1 1)-preferred orientation and smooth surfaces were obtained. The high coercivities of the films were attributed to the residual stress in the films, and the saturation magnetizations were mainly dependent on the oxygen pressure. Higher oxygen pressure could decrease the oxygen deficiencies in the films. Sufficient oxygen ions in the films enhanced the exchange interactions between the magnetic ions, as a result, increasing the saturation magnetization. |
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Keywords: | Cobalt ferrite Crystal structures Magnetism Pulsed-laser deposition |
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