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Influence of deposition conditions on the microstructure of oxides thin films |
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| Authors: | Guanglei Tian Shigang Wu Kangying Shu Jianda Shao |
| Institution: | a College of Science, China Jiliang University, Hangzhou 310018, PR China b School of Material Science and Engineering, Shandong University of Technology, Zibo 255049, PR China c Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, PR China |
| Abstract: | Thin films of ZrO2, HfO2 and TiO2 were deposited on kinds of substrates by electron beam evaporation (EB), ion assisted deposition (IAD) and dual ion beam sputtering (DIBS). Then some of them were annealed at different temperatures. X-ray diffraction (XRD) was applied to determine the crystalline phase and the grain size of these films, and the results revealed that their microstructures strongly depended on the deposition conditions such as substrate, deposition temperature, deposition method and annealing temperature. Theory of crystal growth and migratory diffusion were applied to explain the difference of crystalline structures between these thin films deposited and treated under various conditions. |
| Keywords: | X-ray diffraction Crystal structure Nucleation Oxides films |
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