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Characterization of tungsten-titanium oxide electrode for electrochromic applications |
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| Authors: | Ko-Wei Weng Ya-Chi Chen |
| Institution: | a Department of Materials Science and Engineering, Mingdao University, 369 Wen-Hua Road, Peetow, Changhua 523, Taiwan, ROC b Department of Leisure and Recreation Management, National Taichung Institute of Technology, 129 San-min Road, Section 3, Taichung 404, Taiwan, ROC c Department of Materials Science and Engineering, National Chung Hsing University, 250 Kuo Kuang Road, Taichung 402, Taiwan, ROC |
| Abstract: | Titanium oxide films are of critical importance for the electrochromic device technology. The substrate, a conductive glass being coated with indium tin oxide (ITO) thin films, was deposited tungsten and titanium oxide by pulsed co-sputtering deposition system. The film thickness increased with the ion beam power. However, the slope of the curve of thickness against power at an ion beam power of less than 300 W was greater than that at a power of 400 or 500 W. A high ion beam power resulted produced a crystalline structure, as revealed by X-ray diffraction (XRD). Moreover, increasing the ion beam power resulted in the high Li-ions transport. The electrochromic behavior was optimal at an ion beam power of 200 W. |
| Keywords: | Titanium oxide Co-sputtering Eelectrochromic behavior |
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