Growth and field emission property of coiled carbon nanostructure using copper as catalyst |
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| Authors: | Zhejuan Zhang Pingang He Tao Feng Huili Li |
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| Institution: | a Department of Physics; Engineering Research Center for Nanophotonics & Advanced Instrument, Ministry of Education, East China Normal University, North Zhongshan Rd 3663, Shanghai 200062, China
b School of Electrical and Electronic Engineering, Nanyang Technological University, Nanyang Avenue 50, 639798, Singapore |
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| Abstract: | Coiled carbon nanostructure (CNS) is prepared by a catalytic chemical vapor deposition (CVD) process on copper/chromium films deposited by radio frequency (RF) sputtering. Uniform CNS with coiled structure is fabricated by changing the size of the catalyst particles. The effects of Cu catalyst size and RF sputtering power, on the growth of the coiled CNS are discussed, and the results importantly conclude that Cu-catalyzed CVD offers a preferable control of coiled CNS to optimize the field emission property for application. |
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| Keywords: | Copper catalyst Coiled carbon nanostructure Field emission property |
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