Influence of strain/stress on the nonlinear-optical properties of sprayed deposited ZnO:Al thin films |
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| Authors: | K Bahedi M AddouM El Jouad Z SofianiH EL Oauzzani B Sahraoui |
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| Institution: | a Laboratoire Optoélectronique et Physico-chimie des Matériaux.Unité de recherche associé au CNRST-URAC-14. Université Ibn Tofail, Faculté des Sciences BP 133 Kenitra 14000, Morocco
b Institute of Sciences and Molecular Technologies of Angers, MOLTECH Anjou - UMR CNRS 6200, 2 bd Lavoisier 49045 ANGERS cedex2, France |
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| Abstract: | Nanocrystalline ZnO:Al thin films were deposited by reactive chemical pulverization spray pyrolysis technique on heated glass substrates at 450 °C to study their crystalline structure, composition, strain, stress, roughness characteristics and nonlinear optical susceptibility as a function of Al concentration (0, 2, 3, 5 at.%). The films were characterized by X-ray diffractometer (XRD), EDAX 9100 analyser, atomic force microscopy (AFM) and third harmonic generation (THG). The Al (3 at.%) doped ZnO thin films exhibited the lower strain/stress than undoped films. The nonlinear properties of the ZnO:Al thin films have been found to be influenced by the films strain/stress. |
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| Keywords: | ZnO Al Spray pyrolysis THG Stress Thin films |
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