Research of microstructural characteristics on nanocrystalline diamond by microwave plasma CVD |
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Authors: | Jing-Ming Hung Li-Hsiang Lin Yung-Hsun Shih Chung-Ming Liu Hsin-Chung Cheng Keng-Liang Ou |
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Institution: | a School of Dentistry, College of Oral Medicine, Taipei Medical University, Taipei 110, Taiwan b Research Center for Biomedical Devices, Taipei Medical University, Taipei 110, Taiwan c Research Center for Biomedical Implants and Microsurgery Devices, Taipei Medical University, Taipei 110, Taiwan d Department of Dentistry, Taipei Medical University Hospital, Taipei 110, Taiwan e Dental Department of Wan-Fang Hospital, Taipei Medical University, Taipei 110, Taiwan f Graduate School of Engineering Technology, LungHwa University of Science and Technology, Taoyuan 306, Taiwan g Department of Chemical and Material Engineering, LungHwa University of Science and Technology, Taoyuan 306, Taiwan h Graduate Institute of Biomedical Materials and Engineering, Taipei Medical University, Taipei 110, Taiwan |
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Abstract: | In this study, the nanocrystalline diamond (NCD) films were carried out by microwave plasma chemical vapor deposition (CVD) with CH4/Ar/H2 gas concoction on Si substrate at moderate temperatures. The characteristics of NCD films were evaluated using scanning electron microscopy, Raman spectroscopy, transmission electron microscopy, optical emission spectroscopy and optical contact angle meter. The analytical results revealed that C2 radial was the dominant species in the deposited process. From TEM observation, the NCD films were formed via the etching of hydrocarbons and a small amount of H2 content additive into gas mixture has improved the aggregation of the nucleation film to form the NCD films. The more hydrophobic surfaces imply that NCD films are the potential biomaterial in the application of article heart valve or stent. |
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Keywords: | Nanocrystalline diamond Microwave plasma Chemical vapor deposition Microstructure Wettability |
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