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Structural characterisation of Sb-based heterostructures by X-ray scattering methods
Authors:C Renard  X Marcadet  O Parillaud
Institution:a Alcatel-Thales III-V Lab, Route Départementale 128, F-91767 Palaiseau Cedex, France
b Thales Research and Technology France, Route Départementale 128, F-91767 Palaiseau Cedex, France
c CRHEA/CNRS, Rue B. Gregory, Sophia Antipolis, 06560 Valbonne, France
Abstract:Antimonide-based superlattices dedicated to the elaboration of opto-electronic devices have been studied by X-ray scattering techniques. In particular, specular and non-specular X-ray reflectometry experiments have been performed on two MBE-samples elaborated with different shutter sequences at the interfaces. The results have shown a limitation of the incorporation of Sb species in the subsequent InAs layer for one of the samples, as expected.Then, a study on a InGaAs-cap layer/(InGaAs/AlAsSb)N superlattice grown on a InGaAs/InP buffer layer by both specular X-ray reflectometry and High resolution X-ray diffraction is reported. In particular, the results have revealed the presence of a highly disturbed thin-layer on top of the MOVPE-made GaInAs, whose presence has been explained by In-concentration modification during the desoxidation procedure at the surface of the MOVPE-made GaInAs.Beside the results on the Sb-based heterostructures, the use of X-ray scattering metrology as a routinely working non-destructive testing method has been emphasized.
Keywords:X-ray reflectometry  High resolution X-ray diffractometry  Antimonide heterostructures  Opto-electronic devices  Thickness determination  Fourier-inversion method  Non-specular X-ray reflection
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