Fundamentals and applications of ion-ion plasmas |
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Authors: | Demetre J Economou |
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Institution: | Plasma Processing Laboratory, Department of Chemical and Biomolecular Engineering, University of Houston, Houston, TX 77204-4004, USA |
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Abstract: | Ion-ion plasmas can form in the late afterglow of pulsed discharges or downstream of continuous wave discharges in electronegative gases. In ion-ion plasmas, negative ions replace electrons as the negative charge carriers. In the absence of electrons, ion-ion plasmas behave quite differently compared to conventional electron-ion plasmas. Application of a radio frequency bias to a substrate immersed in an ion-ion plasma can be used to extract alternately positive and negative ions, thereby minimizing charging on device features during micro-device fabrication. Ion-ion plasmas are also important in negative ion sources, dusty plasmas, and the D-layer of the earth's atmosphere. |
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Keywords: | Pulsed plasma Afterglow Charging damage Negative ions Simulation |
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