Effect of film thickness on interface and electric properties of BiFeO3 thin films |
| |
Authors: | Chia-Ching Lee Jenn-Ming Wu |
| |
Institution: | Department of Materials Science and Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan |
| |
Abstract: | Bismuth ferrite (BFO) thin films were fabricated by RF-magnetron sputtering deposition method on Pt/Ti/SiO2/Si(1 0 0) substrate. The effect of the thickness of BFO films varying from 85 to 280 nm on electrical properties was investigated. Saturated coercive fields were found to increase with the BFO film thickness. The dielectric constant of BFO thin films measured at 1 kHz decreased with decreasing thickness from 98 to 86, while tangent losses increased from 0.013 to 0.021. The presence of bismuth oxide at the interface between BFO films and Pt bottom electrodes was responsible for the high leakage currents in thin BFO thin films as was demonstrated by X-ray diffraction, grazing-incident X-ray diffraction, and secondary ion mass spectroscopy analysis. |
| |
Keywords: | Thin film Ferroelectric Film thickness Bismuth ferrite |
本文献已被 ScienceDirect 等数据库收录! |