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Qualitative electroless Ni/Au plating considerations for the solder mask on top of sequential build-up layers
Authors:Sam Siau  Alfons Vervaet  Lieven Degrendele  Johan De Baets  Andre Van Calster
Institution:ELIS-TFCG/IMEC, Universiteit Gent, Sint-Pietersnieuwstraat 41, 9000 Gent, Belgium
Abstract:Advanced printed circuit boards (PCBs) with sequential build-up (SBU) layers require alternating dielectric and copper layers on top of a core substrate. This can be achieved by lamination of resin coated copper (RCC) or by coating of dielectric polymers followed by copper deposition. The plating of electroless Ni/Au used as a solderability preservative on top of sequential build-up layers is investigated. For this application a solder mask polymer has to be applied in order to separate solder pads. Experiments showed that on parts of the underlying build-up layer exposed to the electroless Ni plating solution electroless Ni can grow. This overplating is caused by the remains of colloidal Pd/Sn catalyst on top of the build-up layer from preceding electroless Cu deposition. At very small features skipping of the plating can also take place. The overplating and skipping phenomena are influenced by a number of parameters, such as the temperature, the concentration of the stabilizer and pH. The dimensions of features on the board and the thickness of the solder-mask polymer also influence skipping. Based on qualitative analyses of the skipping and overplating phenomena rules of thumb for the solder mask design based on the plating conditions are proposed.
Keywords:Build-up layer  Solder mask  Electroless Ni plating
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