| ICP—AES法测定高纯二氧化锆中痕量杂质 |
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| 引用本文： | 马晓国,郑文裕.ICP—AES法测定高纯二氧化锆中痕量杂质[J].光谱实验室,1997,14(3):88-89. |
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| 作者姓名： | 马晓国 郑文裕 |
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| 作者单位： | 广东工业大学分析测试中心!广州市东风东路729号，510090，广东工业大学分析测试中心!广州市东风东路729号，510090 |
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| 摘 要： | 介绍了高纯二氧化锆中痕量杂质元素Ｆｅ，Ｎａ，Ｓｉ，Ｔｉ的ＩＣＰ－ＡＥＳ测定方法。样品以浓Ｈ２ＳＯ４及（ＮＨ４）２ＳＯ４溶解，采用空白背景校正法消除基体Ｚｒ的光谱干扰，以基体匹配法补偿基体效应。各元素平均回收率为９５％－１０６％，相对标准偏差为１．３％－３．０％。
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| 关 键 词： | ICP－AES 二氧化锆 杂质 |
Determination of Trace Impuritise in High-Purity Zirconium Oxide by ICP-AES |
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| MA Xiaoguo, ZHENG Wenyu.Determination of Trace Impuritise in High-Purity Zirconium Oxide by ICP-AES[J].Chinese Journal of Spectroscopy Laboratory,1997,14(3):88-89. |
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| Authors: | MA Xiaoguo ZHENG Wenyu |
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| Abstract: | This paper describes the method for the determination of trace Fe,Na,Si and Ti in high-purityzirconium oxide by ICP-AES. The samples were dissolved by sulfUric acid and ammonium sulfate.Spectral interferences were corrected by blank background correction technique and matrin effect was compensated by using matris matchinS' The recoveries are within 95% - 106 % and relative standard dehation within 1. 3 % - 3. 0% . |
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| Keywords: | ICP-AES Zirconium Oxide Impurities |
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