Enhanced production of fast multi-charged ions from plasmas formed at cleaned surface by femtosecond laser pulse

We present atomic, energy, and charge spectra of ions accelerated at the front surface of a silicon target irradiated by a high-contrast femtosecond laser pulse with an intensity of 3×10¹⁶ W/cm², which is delayed with respect to a cleaning nanosecond laser pulse of 3-J/cm² energy density. A tremendous increase in the number of fast silicon ions and a significant growth of their maximum charge in the case of the cleaned target from 5+ to 12+ have been observed. The main specific features of the atomic, energy, and charge spectra have been analyzed by means of one-dimensional hydrodynamic transient-ionization modeling. It is shown that fast highly charged silicon ions emerge from the hot plasma layer with a density a few times less than the solid one, and their charge distribution is not deteriorated during plasma expansion.This revised version was published online in August 2005 with a corrected cover date.