电光材料调制误差对平行光束干涉投影的影响

为研究电光材料调制误差对干涉条纹质量的影响，建立了电光晶体对干涉条纹的成像模型，分析了晶体折射率、平面度与波前调制的关系及其非理想情况下的条纹成像特征。实验表明，晶体折射率的畸变会使干涉条纹变形，折射率离散化阶数直接造成投影条纹的高次谐波成分，甚至使投影条纹严重失真；在折射率线性增长的情况下，晶体平面度在0.1 μm的范围内也会引起干涉条纹畸变。

Effect of electro optic material modulation error on parallel beam interference projection

To study the influence of modulation error of electro optic material on the quality of the interference fringes, an imaging model for interference fringes in electro optic crystal was established. The relationship among the refractive index, the flatness and the wavefront modulation was analyzed, as well as the fringes imaging characteristics under the non ideal conditions. The experimental results show that the distortion of the refractive index of the crystal can causes the distortion of the interference fringes, the high harmonic components of the projection fringes are directly caused by the discrete order of refractive index, even severe distortion of projected fringes; In the case of the refractive index of linear growth, the crystal plane in a range of 0.1 μm can also cause interference fringes distortion.