温度条件对反应电子束蒸发制备TiO2薄膜结构和性能的影响

研究基片温度(120～300 ℃)和热处理温度(400℃)对电子束蒸发TiO₂薄膜的结构和光学性能的影响.XRD分析表明,在120 ℃, 200 ℃和300 ℃的普通玻璃基片上采用电子枪加热蒸发制备的TiO₂薄膜具有非晶态结构,沉积态薄膜经过400 ℃保温1 h的热处理后得到的相为具有(004)取向的锐钛矿相,晶粒大小在3.6～8.1 nm之间.透射谱分析表明,薄膜的折射率随着基片温度的升高而增加;热处理后,薄膜的折射率也相应提高,其原因来自于薄膜的晶化.

Effect of Temperature on Structure and Optical Property of TiO2 Thin Film Deposited by Reactive Electron Beam Evaporation

Effect of substrate temperatures (from 120℃ to 300℃) and heat treatment temperature(400℃) on the structure and optical property of TiO2 thin film deposited by electron beam evaporation method is discussed. The XRD analysis results indicates that the structure of TiO2 thin films deposited on common glass at the substrate temperatures of 120℃, 200℃ and 300℃ is amorphous, and after the heat treatment at 400℃ for one hour,the amorphous structure crystallized and the crystal phase is anatase with strong preferred orientation(004) and the size of the crystalline is within 3.6～8.1nm.The analysis on transmittance spectrum of all samples shows that with the substrate temperature increasing, the refractive index of thin films increases, and after heat treatment higher refractive index of the films is raised due to its crystallizing.