ALD氧化铝单层膜1 064 nm激光损伤特性研究

 采用原子层沉积技术(atomic layer deposition，ALD)在熔石英和BK7玻璃基底上镀制Al2O3单层膜。利用小口径损伤在线测试平台对膜层的1 064 nm激光损伤特性进行了实验测量，获得膜层损伤阈值约为10.3 J/cm2，对比了其与BK7基底损伤阈值之间的差异；利用Nomarski显微镜和原子力显微镜分析讨论了损伤形态的特点，结果表明损伤主要表现为膜层脱落和基片小孔烧蚀，其中小孔深度集中在70 nm～95 nm范围；讨论了损伤发生的诱因，得出膜基界面可能存在吸收源先驱的推断。

Characterization of 1 064 nm laser induced damagein ALD optical film

Based on Atomic Layer Deposition(ALD) technology,the single layer films were coated on fused silica and BK7 glass substrate respectively.Using small optical damage test facility,the 1064 nm laser induced damage threshold between ALD films and BK7 substrate was compared.The result shows that the ALD film damage threshold is about 10.3 J/cm2.With the use of Nomarski microscope and Atomic Force Microscope,the morphology of damage site was discussed.The result shows that there are two kinds of damage,the peelin...