一种红外双半波滤光片的设计和制造方法

针对唐晋发、郑权老师在《应用薄膜光学》一书中介绍的采用低折射率材料做间隔层，用16个λ/4层完成红外双半波滤光片的设计方法制作的薄膜易发生断裂，该文给出该膜系另一种设计计算方法，即采用高折射率材料做间隔层，用12个λ/4完成膜系设计。与前者相比，该方法节省了材料和时间。同时给出了镀制该膜系的工艺要点，并对镀膜过程中的初始真空度、蒸镀温度和2种材料的蒸发速率做了说明。指出在该工艺实施过程中，首先使用离子源对基底进行活化轰击，然后在蒸镀硫化锌和锗的过程中用离子源进行辅助蒸镀，可得到非常牢固的膜层。

Design and fabrication of infrared double half wave filter

The infrared double half-wave filter was traditionally implemented with sixteen λ/4 layers and a low refractive index material as its interval according to the design introduced in Applications Optical Coating written by Mr. Tang Jinfa,Zheng Quan. However,the film prepared by such design tends to crack easily. To solve this problem,a new design for infrared double half-wave filter is presented. A high refractive index material was taken as interval and twelve λ/4 layers was used. Compared to the previous design,it is more economic and timesaving. Detailed technology on how to design and fabricate infrared double halfwave filter is given,and process parameters such as base pressure of chamber,control of temperature and the rate of deposition are described. In the course of deposition,ion source was employed to process substrate and to assist ZnS and Ge evaporation. A satisfactory result was achieved with such design.