微结构窄带滤光片设计及制备工艺研究

为了提升微结构窄带滤光片的光谱透过率，增大微结构单元的制备精度，提出一种新的膜系镀制方法和微结构单元的制备方法。基于法布里-珀罗(F-P)多光束干涉仪原理设计了3种不同中心波长的窄带滤光片，采用光化学掩模分离法和PECVD技术相结合，制备出3种中心波长分别为480 nm、520 nm和590 nm，峰值透过率均大于80%，半宽度30 nm~50 nm，微结构单元的通道面积为50 μm×50 μm的窄带滤光片。光谱透过率得到了提升的同时微结构单元边缘整齐、分界线清晰，精度也得到了有效地增加，达到μm量级。

Design and fabrication of microstructure narrowband filter

In order to improve transmittance of microstructure narrowband filters and increase precision of microstructure unit, new fabrication method of film deposition and microstructure unit are proposed in this paper. Three different center wavelength filters are design based on concepts of Fabry-Perot principle. Three different center wavelength of narrowband filters are fabricated by combining photochemical mask separation and PECVD technology. Center wavelength of narrowband filters are λ₁=480 nm、λ₂=520 nm and λ₃=590 nm respectively, transmittance are all above 80%, with bandwidth between 30 nm to 50 nm and an area for each microstructure unit 50×50 μm2. Transmittance is improved, while precision of microstructure unit are increased to reach micron order effectively with neat edge and clear dividing line.